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Development and industrialization of key technologies for large size high-end indium tin oxide (ITO) targets
Domestic size high-end ITO targets break through the display bottleneck and empower the flat panel industry.
Type
Material technology
Tags
Other resource gains
Industrialization
Chemical
Large size
Physics
Chemical engineering
Ito target
High welding rate
Solution maturity
Mass promotion / Mass production
Cooperation methods
Joint venture cooperation
Face-to-face consultation
Applicable industry
Manufacturing
Applications
Flat panel display
Key innovations
This product achieves high-density, high-bonding rate binding and non-etching residual coating in the preparation of ITO targets, significantly reducing material loss, improving efficiency, filling domestic gaps, and providing breakthrough innovation.
Potential economic benefits
This ITO target technology breaks through foreign monopolies, improves the supporting facilities of the domestic flat panel display industry chain, improves the deep processing capabilities of rare indium, and promotes the healthy and safe development of the industry. The project has added a total of 460 million yuan in new economic benefits in the past three years and has been successfully exported to the United States.
Potential climate benefits
Reduce target preparation waste, improve target life, reduce etching losses in display screen production, and significantly improve material and energy utilization efficiency, thereby reducing carbon emissions.
Solution supplier
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Shanghai University
Shanghai University
Shanghai University is a comprehensive research university in Shanghai, committed to cultivating high-quality innovative talents and serving national and regional economic and social development.
Shanghai,China
Solution details

The project belongs to the discipline of inorganic non-metallic materials in the field of materials science. my country's flat panel display industry ranks first in the world in production capacity. Large size flat panel displays are an inevitable trend in future technological development. At present, high-end ITO targets for large size displays rely heavily on imports, restricting the development of my country's large size flat panel display production and becoming a technical barrier from a big country to a strong country. Therefore, the development of size high-end ITO targets is the key to breaking through technical bottlenecks. However, material preparation is difficult and the process is complex, and it faces the following three challenges: it is difficult to have high density of large size targets, it is difficult to bind multiple targets in large areas with high welding rates, and it is difficult to pattern thin films without etching residues. Focusing on the above three problems, with the support of a number of national, provincial and ministerial projects, and after more than ten years of research, we have made breakthroughs in key technologies such as the preparation of ITO powder with controllable particle size, the shaping of large size ITO target bodies, and ultra-high density ITO target sintering, high welding rate back indium binding and amorphous coating. We have formed independent innovation in the overall technology of high-end ITO target manufacturing, achieved industrialization, broke the technical blockade of Japan and South Korea, and improved my country's flat panel display industry chain, and improved my country's deep processing capabilities of rare indium. It has promoted the healthy and safe development of my country's flat panel display industry. The main technical innovations are as follows: Innovation points 1. Aiming at the bottleneck problem that large-size ITO targets are difficult to achieve high density, a method for uniformly controlling the particle size of ITO nano powder by soft and hard mixed ball milling is proposed, and a two-step cold extrusion process of floating molding and vacuum coating is invented. Extrusion green body forming technology has developed a thermal insulation shunting and micro-flow oxygen-supplementing sintering process to regulate the shape of the tin-containing second phase, realizing the manufacture of large-size high-end targets. The size of a single target is increased from 200mm times;200mm to 1000mm times;500mm, the width of single-sided trimming waste is reduced from 18mm to 3mm, and the density is increased from 95.8% to 99.9%. Innovation point 2. Aiming at the problem of low large-area binding and welding rate of multiple large size targets, which leads to easy nodules, ultrasound-assisted hot melting back indium metallization technology and temperature multi-gradient uniform cooling have been developed. The process of effectively controlling shrinkage rate has been developed, realizing large-area binding of multiple large size targets (1650mm times;1431mm). The binding and welding rate has been increased from 92.4% to 99.9%, and the phenomenon of target sputtering and nodding phenomenon has been significantly improved. The frequency of nodules and opening cavity polishing has been reduced from 4 times to 2 times within the target life range. Innovation point 3. The etching residue caused by the low-temperature crystallization of magnetron sputtered ITO films will lead to the display of bright spots defects. The correlation mechanism between the second phase distribution of the target and the crystallization of the film was studied, and the low-temperature amorphous coating process of ITO films was developed. Technology, the prepared amorphous ITO film can effectively solve the problem of etching residue and reduce the pattern line width loss by 25%. The project proposes a high-density and size ITO target manufacturing technology, develops a high-bonding rate multi-piece target large-area back indium binding process, and develops an ITO target amorphous coating technology without etching residues., realizing the industrialization of a complete set of technologies from powder, forming, sintering, binding to coating for high-end ITO targets for flat panel displays. The technical appraisal organized by Shanghai City Vacuum Society and the scientific and technological novelty search report of Shanghai City Institute of Science and Technology Information both believe that the project technology has reached the international advanced level. The results have been promoted and applied to 16 high-generation flat panel display production lines such as BOE and Huaxing Optoelectronics, and exported to the United States. The project authorized 27 patents (including 18 invention patents) and published 42 papers (including 33 SCI papers). The project has built a new ITO target production line with an annual output of 200 tons, with a total of 460 million yuan in new economic benefits in the past three years (including 130 million yuan in new benefits per unit). Drafted 1 national industry standard, won 1 provincial new product, and won the Innovation Award of China Electronic Information Expo. It has produced significant economic and social benefits.

Last updated
10:35:31, Nov 05, 2025
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