1. application field

In the manufacturing of electronic components, especially semiconductor components, the contact resistivity between various materials directly affects the performance of the components and reflects the level of device manufacturing technology. The measurement of contact resistance and contact resistivity is an important indicator in the manufacturing and performance characterization of various electronic components, especially semiconductor components. It is necessary to accurately, conveniently and quickly measure the contact resistivity. For example, this system is used to quantitatively characterize the interface contact resistivity between thermoelectric materials and electrodes of thermoelectric devices, and between two thermoelectric materials in multi-segment thermoelectric elements. It is an important technical means for the development of high-performance thermoelectric devices.

2. technical characteristics

(1) Machine vision and motion control are used to realize accurate positioning and resistance measurement of the test probe on the surface of the sample to be tested. The positioning is accurate, the precision is high, the repeatability is good, the operation is simple, the sample is not scratched, and the sample size range is wide;

(2) Using industrial cameras to replace the human eye can effectively avoid eye fatigue of testers and improve testing efficiency.

3. performance Index

(1) The size range is 2×2×2mm to 10×10×20 mm.

(2) The test accuracy is ±0.5μΩ.cm2.

4. current state

(1) At present, the laboratory has built two related test equipment, testing more than 500 batches of samples, and the system is running reliably.

(2) Enterprise standards have been compiled but have not yet been released.